Ion Implant


  • Grid Chamber based implant system
  • Complete system control including RF, Process Grid and Target
  • Vacuum, gas delivery and thermal management
  • High Voltage control and safety systems
  • High-vacuum target chamber for particle accelerator-based implant system
  • 2 and 4 MeV implant energy with dose measurement and stage robotics
  • Cryogenics high-vacuum system for chamber and beam line
  • Radiation shielding with safety systems, water cooling and electronics shielding
  • Beam line system with measurement, quad magnets, dithering magnets and control